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Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process

Computer modeling as a tool to predict deposition rate and film composition in the reactive... http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films CrossRef

Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 16 (3): 1277-1285 – May 1, 1998

Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 16 (3): 1277-1285 – May 1, 1998

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Publisher
CrossRef
ISSN
0734-2101
DOI
10.1116/1.581274
Publisher site
See Article on Publisher Site

Abstract

Journal

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and FilmsCrossRef

Published: May 1, 1998

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